红外光谱和拉曼光谱法研究白炭黑的微观结构 |
Study on Microstructure of Silica by Infrared Spectroscopy and Raman Spectroscopy |
投稿时间:2021-05-07 修订日期:2021-05-07 |
DOI:10.12136/j.issn.1000-890X.2022.08.0623 |
中文关键词: 沉淀法白炭黑 气相法白炭黑 红外光谱 拉曼光谱 微观结构 羟基 |
英文关键词: precipitated silica fumed silica infrared spectroscopy Raman spectroscopy microstructure hydroxyl |
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中文摘要: |
用红外光谱和拉曼光谱分析沉淀法白炭黑和气相法白炭黑的微观结构。结果表明:与气相法白炭黑相比,沉淀法白炭黑表面羟基含量相对较高;未经热处理的沉淀法白炭黑表面覆盖结合水分子,随着处理温度的升高,沉淀法白炭黑表面先失去羟基结合水分子,然后发生羟基缩合反应,直至最后失去所有羟基,形成Si—O—Si网络结构;气相法白炭黑未经热处理时即可明显观察到羟基的存在,且处理温度对其结构影响不明显,这可能是沉淀法白炭黑与气相法白炭黑生产工艺不同造成的。 |
英文摘要: |
Abstract:The microstructures of the precipitated silica and fumed silica were analyzed by infrared
spectrum and Raman spectrum. The results showed that,compared with the fumed silica,the surface hydroxyl
content of the precipitated silica was higher,the surface of the precipitated silica without heat treatment was
covered by bound water molecules,and with the increase of treatment temperature,the water molecules bound
to the hydroxyl groups on the surface of the precipitated silica were removed,and then the hydroxyl group
condensation reaction occurred,until finally all the hydroxyl groups were lost,and a Si—O—Si network
structure was formed. On the other hand,the existence of the hydroxyl groups could be clearly observed on
the surface of the fumed silica without heat treatment,and the treatment temperature had no obvious effect
on the structure of the fumed silica. This might be attributed to the different manufacturing process of the
precipitated silica and fumed silica. |
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